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In another embodiment, the invention is a method of forming a semiconductor device. A shallow trench isolation region is formed in a semiconductor substrate, a body region is formed over the semiconductor substrate, the body region is doped with an impurity, and a source region and a drain region are formed in the body region. The source region and the drain region each extend into the semiconductor substrate, and the body region is doped to form a depletion region at a contact interface between the body region and the source region or the drain region. A dielectric is formed over the semiconductor substrate, the source region, the drain region, and the shallow trench isolation region. The dielectric further has a plurality of contact holes and a plurality of conductive plugs each extending through a portion of the dielectric and forming electrical connection to the body region, the source region, and the drain region. A doped region is formed on each side of the body region at the depletion region interface, the doped region compensating for a dopant concentration gradient in the body region.Combined vaginal misoprostol and manual vacuum aspiration in the treatment of incomplete abortion: a prospective randomized controlled trial.
To compare the effectiveness and safety of a combined vaginal misoprostol and manual vacuum aspiration (MVA) with a MVA-only for second-trimester incomplete abortion. A prospective randomized controlled trial was conducted in Gynaecology Department of Zhangwu Central Hospital, from February 2010 to May 2011. One hundred and eighty-three women with incomplete abortion were randomly assigned to group I (misoprostol + MVA; n = 90) or group II